Molybdenum Target
Molybdenum target can be used for magnetron sputtering coating, which is a kind of physical vapor deposition (PVD).
An orthogonal magnetic field and an electric field are applied between the sputtered target (cathode) and the anode, and the required inert gas is charged in the high vacuum chamber. Under the action of the electric field, the gas is ionized into positive ions and electrons, and the target is added. There is a certain negative high voltage. The electrons emitted from the target are affected by the magnetic field and the ionization probability of the working gas increases. A high-density plasma is formed near the cathode, and the ions accelerate to fly toward the target surface under the action of Lorentz force. The target surface is bombarded at a high speed, so that the sputtered atoms on the target follow the momentum conversion principle to fly away from the target surface to the substrate to deposit a film with higher kinetic energy.
Sputter coating is mainly used in: flat panel display, coated glass industry (mainly including architectural glass, automotive glass, optical film glass, etc.), thin film solar energy, surface engineering (decoration & tools), (magnetic, optical) recording media, microelectronics , car lights, decorative coatings, etc.
